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Summary
| Description |
English: The lithography wavelength has not changed much to match the required resolution. The required resolution has been achieved when necessary by a combination of resolution enhancement techniques such as off-axis illumination and phase-shift masks, higher numerical aperture lenses, and more recently fluid immersion. Beyond 45 nm node, the 193 nm wavelength is further extended by double patterning. |
| Date | 19 October 2008 (original upload date) |
| Source | Transferred from en.wikipedia to Commons. |
| Author | Guiding light at English Wikipedia |
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Permission is granted to copy, distribute and/or modify this document under the terms of the GNU Free Documentation License, Version 1.2 or any later version published by the Free Software Foundation; with no Invariant Sections, no Front-Cover Texts, and no Back-Cover Texts. A copy of the license is included in the section entitled GNU Free Documentation License. |
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Original upload log
The original description page was here. All following user names refer to en.wikipedia.
| Date/Time | Dimensions | User | Comment |
|---|---|---|---|
| 2008-10-19 04:24 | 430×390× (7521 bytes) | Guiding light | The lithography wavelength has not changed much to match the required resolution. The required resolution has been achieved when necessary by a combination of resolution enhancement techniques such as off-axis illumination and [[phase-shift masks]], highe |
File history
Click on a date/time to view the file as it appeared at that time.
| Date/Time | Thumbnail | Dimensions | User | Comment | |
|---|---|---|---|---|---|
| current | 10:07, 28 February 2016 | | 430 × 390 (7 KB) | FastilyClone | Transferred from enwp |
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